325. Study of thermal reduction of graphene oxide for device applications, M. Acik, R. Guzman, and Y. J. Chabal, SRC Techcon proceedings (2010).
324. XeF2-induced removal of SiO2 near Si surfaces at 300 K: An unexpected proximity effect, J. F. Veyan, M. D. Halls, S. Rangan, D. Aureau, X. M. Yan, and Y. J. Chabal, Journal of Applied Physics 108 (11), 114914 (2010).
323. Comparative time-resolved study of the XeF2 etching of Mo and Si, J. F. Veyan, D. Aureau, Y. Gogte, P. Campbell, X. M. Yan, and Y. J. Chabal, Journal of Applied Physics 108 (11), 114913 (2010).
322. Infrared Characterization of Interfacial Si-O Bond Formation on Silanized Flat SiO2/Si Surfaces, R. Tian, O. Seitz, M. Li, W. C. Hu, Y. J. Chabal, and J. M. Gao, Langmuir 26 (7), 4563 (2010).
321. Modification of the Adhesive Properties of XeF2-Etched Aluminum Surfaces by Deposition of Organic Self-Assembled Monolayers, K. Roodenko, O. Seitz, Y. Gogte, J. F. Veyan, X. M. Yan, and Y. J. Chabal, The Journal of Physical Chemistry C 114 (51), 22566 (2010).
320. Modified phonon confinement model for Raman spectroscopy of nanostructured materials, K. Roodenko, I. A. Goldthorpe, P. C. McIntyre, and Y. J. Chabal, Physical Review B 82 (11), 1152210 (2010).
319. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro, M. Petrantoni, C. Rossi, L. Salvagnac, V. Conedera, A. Esteve, C. Tenailleau, P. Alphonse, and Y. J. Chabal, Journal of Applied Physics 108 (8), 084323 (2010).
318. Atomic Layer Deposition of Ru/RuO2 Thin Films Studied by In situ Infrared Spectroscopy, S. K. Park, R. Kanjolia, J. Anthis, R. Odedra, N. Boag, L. Wielunski, and Y. J. Chabal, Chemistry of Materials 22 (17), 4867 (2010).
317. Multiscale modeling of interaction of alane clusters on Al(111) surfaces: A reactive force field and infrared absorption spectroscopy approach, J. G. O. Ojwang, S. Chaudhuri, A. C. T. van Duin, Y. J. Chabal, J. F. Veyan, R. van Santen, G. J. Kramer, and W. A. Goddard, Journal of Chemical Physics 132 (8), 084509 (2010).
316. Interaction of molecular hydrogen with microporous metal organic framework materials at room temperature, N. Nijem, J.-F. Veyan, L. Kong, K. Li, S. Pramanik, Y. Zhao, J. Li, D. Langreth, and Y. J. Chabal, Journal of the American Chemical Society 132 (5), 1654 (2010).
315. Molecular Hydrogen “Pairing” Interaction in a Metal Organic Framework System with Unsaturated Metal Centers (MOF-74), N. Nijem, J. F. Veyan, L. Z. Kong, H. H. Wu, Y. G. Zhao, J. Li, D. C. Langreth, and Y. J. Chabal, Journal of the American Chemical Society 132 (42), 14834 (2010).
314. Nanopatterning Si(111) surfaces as a selective surface-chemistry route, D. J. Michalak, S. R. Amy, D. Aureau, M. Dai, A. Esteve, and Y. J. Chabal, Nature Materials 9 (3), 266 (2010).
313. Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices, B. Lee, G. Mordi, M. J. Kim, Y. J. Chabal, E. M. Vogel, R. M. Wallace, K. J. Cho, L. Colombo, and J. Kim, Applied Physics Letters 97 (4), 043107 (2010).
312. Suppression of substrate oxidation during ozone based atomic layer deposition of Al2O3: Effect of ozone flow rate, J. Kwon, M. Dai, M. D. Halls, and Y. J. Chabal, Applied Physics Letters 97 (16), 162903 (2010).
311. Effects of TaN, Ru, and Pt electrodes on thermal stability of hafnium-based gate stacks, J. Kwon and Y. J. Chabal, Journal of Applied Physics 107 (12), 123505 (2010).
310. Thermal stability comparison of TaN on HfO2 and Al2O3, J. Kwon and Y. J. Chabal, Applied Physics Letters 96 (15), 151907 (2010).
309. Effect of mobile ions on ultrathin silicon-on-insulator-based sensors, P. G. Fernandes, O. Seitz, R. A. Chapman, H. J. Stiegler, H. C. Wen, Y. J. Chabal, and E. M. Vogel, Applied Physics Letters 97 (3), 034103 (2010).
308. Effects of the Local Environment on Si-H Stretching Frequencies for the Mixed Coverage X/H:Si(111) Surface (X=F, CI, Br, and I), G. A. Ferguson, D. Aureau, Y. Chabal, and K. Raghavachari, Journal of Physical Chemistry C 114 (41), 17644 (2010).
307. Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide, M. Dai, J. Kwon, M. D. Halls, R. G. Gordon, and Y. J. Chabal, Langmuir 26 (6), 3911 (2010).
306. Structural evolution during the reduction of chemically derived graphene oxide, A. Bagri, C. Mattevi, M. Acik, Y. J. Chabal, M. Chhowalla, and V. B. Shenoy, Nature Chemistry 2 (7), 581 (2010).
305. Controlled Deposition of Gold Nanoparticles on Well-Defined Organic Monolayer Grafted on Silicon Surfaces, D. Aureau, Y. Varin, K. Roodenko, O. Seitz, O. Pluchery, and Y. J. Chabal, The Journal of Physical Chemistry C 114 (33), 14180 (2010).
304. The Role of Intercalated Water in Multilayered Graphene Oxide, M. Acik, C. Mattevi, C. Gong, G. Lee, K. Cho, M. Chhowalla, and Y. J. Chabal, ACS Nano 4 (10), 5861 (2010).
303. Unusual infrared-absorption mechanism in thermally reduced graphene oxide, M. Acik, G. Lee, C. Mattevi, M. Chhowalla, K. Cho, and Y. J. Chabal, Nature Materials 9 (10), 840 (2010).
302. Generation and capture of CO2 and CO in graphite oxide stacks during thermal reduction M. Acik, R. Guzman, and Y. Chabal, Mater. Res. Soc. Symp. Proc. 1205E, 1205 (2010).
