Manuscript JVA21-AR-FADLEY2021-00201R, entitled “Operando Study of the Preferential Growth of SiO2 During the Dry Thermal Oxidation of Si0.60Ge0.40(001) by Ambient Pressure X-ray Photoelectron Spectroscopy.”

manuscript JVA21-AR-FADLEY2021-00201R, entitled “Operando Study of the Preferential Growth of SiO2 During the Dry Thermal Oxidation of Si0.60Ge0.40(001) by Ambient Pressure X-ray Photoelectron Spectroscopy.” is now published in the special issue: Commemorating the Career of Charles S. Fadley.